MICRO/NANO FABRICATION
Lithography systems for research and process development.
Choose a patterning route by feature size, exposure area, overlay, substrate, throughput conditions and required workflow.
Discuss a lithography application ↗01 / DMD DIRECT WRITE
Maskless lithography
Digital-pattern flexibility for microscale fabrication.
Rapid iteration, grayscale workflows and larger exposure areas without a physical mask.
ZML10AZML100AZML200A
Compare ZML systems →02 / ELECTRON BEAM
Nanoscale patterning
Critical features beyond optical lithography scale.
Field-emission electron-beam writing with stitching, overlay and multilayer exposure functions.
ZEL304GEBL20-BIT DAC
Explore electron beam lithography →TECHNOLOGY SELECTION
DMD or electron beam?
Use DMD for flexible microscale patterning and broader areas; use EBL when the critical feature demands nanoscale direct writing. Hybrid workflows can combine both.