01 / POSITION
Optical encoders
Close the loop with the right feedback architecture.
Incremental and absolute, linear and rotary, miniature and vacuum-oriented configurations.
LinearRotaryBiSS-CVacuum
Explore encoder selection →PRECISION MOTION · MICRO/NANO FABRICATION
Engineering systems for position feedback and patterning.
SENFU Technology supplies source-backed optical encoders and lithography systems for OEM equipment, precision motion platforms and advanced research.
Have a defined requirement? Discuss your application ↗
FORMATIncremental
FORMMiniature linear
DATATraceable
12 tracked product models2 technology platforms1 controlled data sourceConflicting claims are blocked from publication.
SENFU TECHNOLOGY
Shenzhen-based technical supplierProduct selection, configuration review and engineering documentation for precision motion and micro/nano fabrication.
About SENFU →TWO TECHNOLOGY PLATFORMS
Select by engineering objective.
Start with the feedback or fabrication requirement, then compare configurations using parameters tied to original technical sources.
02 / FABRICATION
Lithography systems
Move from digital pattern to micro- and nanoscale structures.
DMD maskless, grayscale and electron-beam platforms for research and advanced fabrication.
DMDDirect writeGrayscaleEBL
Compare lithography routes →BUILT AROUND REQUIREMENTS
Specifications mean more when the operating condition is visible.
Resolution, speed, overlay and throughput are not treated as isolated headline numbers. We preserve the configuration and source context needed for technical evaluation.
Review engineering resources →Incremental & absolute
Match homing, interface and position retention requirements.
Linear & rotary
Select feedback geometry around travel, envelope and motion profile.
Vacuum configurations
Surface exact vacuum grade and outgassing gaps before selection.
DMD & electron beam
Choose the patterning route by feature size, area, overlay and workflow.
APPLICATION ROUTES
Find a solution for your application.
Engineering pages connect process challenges to critical specifications, suitable systems and the evidence needed for evaluation.
01
Semiconductor equipment
Position feedback and fabrication tools for tightly controlled process environments.
↗02Precision motion
Encoder selection for linear motors, XY stages and closed-loop positioning.
↗03Vacuum motion
Compact optical feedback configurations for vacuum-oriented motion systems.
↗04MEMS & microfluidics
Direct-write lithography platforms for iterative microscale device development.
↗05Photonics & micro-optics
Grayscale and aligned exposure workflows for optical microstructures.
↗06Quantum & nanofabrication
DMD and electron-beam routes from large-area patterns to critical nanoscale features.
↗FEATURED SYSTEMS
Start with the most defined product records.
The first release prioritizes models with the strongest source coverage. Configuration-dependent claims remain qualified.
Source-backed dataSMG20
Miniature optical linear encoder
Compact incremental feedback for constrained precision-motion assemblies.
- 20 µm scale pitch
- Readhead: 5 × 12 × 21 mm
Source-backed dataSMG26
High-speed incremental linear encoder
A larger-pitch architecture with configurations for high-speed positioning.
- 256 µm scale pitch
- Resolution options down to 4 nm
Source-backed dataZML SERIES
DMD maskless lithography systems
Direct-write platforms spanning compact R&D through larger-substrate configurations.
- 385 / 405 nm
- DXF / GDS / BMP pattern formats
ENGINEERING EVIDENCE
A claim is only useful when its source and conditions travel with it.
Our content system separates brand, supplier and manufacturer roles; traces technical fields to source documents; and blocks conflicting or internal-only facts from public pages.
ParameterSource ID + locator
CertificateModel-level scope
PerformanceConditions retained
APPLICATION REVIEW
Bring us the requirement, not just a part number.
Share travel, resolution, environment, substrate or process targets. We will structure the next technical questions around your application.
Discuss your application ↗