TECHNOLOGY CENTER
Engineering knowledge for better selection decisions.
Evergreen guides explain the tradeoffs behind feedback architecture, metrology, vacuum integration and lithography routes.
Ask a technical question ↗Incremental vs absolute encoder: which feedback system should you choose?
Compare position availability, homing, interface, system recovery and motion requirements.
Read guide →GUIDE / 02Encoder resolution vs accuracy: avoid the most common specification error.
Resolution is the smallest reported increment; accuracy describes closeness to the true position under stated conditions.
Read guide →GUIDE / 03DMD maskless lithography vs electron beam lithography.
Choose between broader-area optical direct write and critical nanoscale electron-beam patterning.
Read guide →GUIDE / 04Hybrid lithography: combining maskless and electron beam lithography.
Assign large microscale patterns to DMD exposure and reserve EBL for critical nanoscale structures.
Read guide →GUIDE / 05Vacuum encoder selection guide.
Define pressure, material, cable, thermal and contamination requirements before selecting an encoder configuration.
Read guide →GUIDE / 06BiSS-C encoder: interface, timing and selection guide.
Understand how a BiSS-C encoder communicates absolute position and what to verify before integrating it into a precision motion system.
Read guide →GUIDE / 07Encoder scale pitch: how to choose the right pitch for speed and resolution.
Learn how optical encoder scale pitch influences interpolation, signal frequency, dynamic performance and the final motion-system error budget.
Read guide →GUIDE / 08Maskless lithography for microfluidics: process requirements and system selection.
Use DMD maskless lithography to iterate microfluidic layouts, multilayer features and device prototypes without fabricating a physical mask for every design change.
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