Nanoscale patterning
Field-emission electron optics support critical feature development below optical lithography scale.
ELECTRON BEAM LITHOGRAPHY
ZEL304G Electron Beam Lithography System
A Schottky field-emission electron beam lithography system for nanoscale patterning, aligned multilayer exposure and advanced research.
Brand ZEPTOOLSSupplied by SENFU Technology
ZEL304GSOURCE-BACKED RECORD
PRODUCT OVERVIEW
Selection starts with the operating requirement.
ZEL304G addresses critical nanoscale structures where electron-beam resolution is required. Stage and acceleration-voltage wording remains qualified pending manufacturer confirmation.
Open technical itemStage-travel semantics and the stated minimum acceleration voltage require confirmation.
ENGINEERING VALUE
What this platform brings to the design.
Aligned exposure
Documented functions include field stitching, overlay and multi-layer exposure.
Pattern workflow
GDSII, DXF and BMP inputs connect established design formats to the write system.
KEY SPECIFICATIONS
Source-backed technical data.
These fields are projected from the product master record. Conflicting, missing and internal-only values do not enter this table.
- Electron Gun
- Schottky field emission
- Image Resolution
- ≤1 nm @ 15 kV / ≤1.5 nm @ 1 kV
- Beam Current
- ≥100 nA
- Minimum Spot Size
- ≤2 nm
- Write Field
- ≤500 × 500 µm
- Single Exposure Linewidth
- <15 nm · Process dependent
- Dac Resolution
- 20 bit
- Pattern Formats
- GDSII / DXF / BMP
Source record: SRC-ZEP-ZEL-BRO-001
SUITABLE APPLICATIONS
Evaluate fit in context.
↗Quantum devices
↗Nanophotonics
↗2D materials
↗Advanced semiconductor R&D
ENGINEERING DOCUMENTATION
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Downloads are linked to this product record. Commercial terms, final configuration and suitability remain subject to technical review.
TECHNICAL EVALUATION
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