MINIATURE INCREMENTAL LINEAR FEEDBACK

MICRON-P2 Miniature Incremental Optical Encoder

A compact HOPO incremental optical encoder for tight integration envelopes, with glass and stainless-scale configurations documented.

Brand HOPOSupplied by SENFU Technology
MICRON-P2 Miniature Incremental Optical Encoder product image
MICRON-P2SOURCE-BACKED RECORD
Scale Pitch20 µm
Standard Resolution Options5 / 10 / 20 / 50 / 100 nm
Readhead Dimensions21 × 10 × 5 mm
Installation Gap0.6 ±0.1 mm

PRODUCT OVERVIEW

Selection starts with the operating requirement.

MICRON-P2 can be evaluated for compact precision stages. Public selection data uses source-consistent standard resolutions only; the disputed 1 nm marketing statement is blocked.

Open technical itemThe 1 nm / 5 nm / 10 nm source conflict must be resolved before broader resolution claims are published.

ENGINEERING VALUE

What this platform brings to the design.

01

Miniature package

A 21 × 10 × 5 mm readhead supports compact machine layouts.

02

Defined installation gap

Source drawings provide a nominal sensing gap for mechanical integration.

03

Material options

Glass and stainless scale formats support different travel and mounting strategies.

KEY SPECIFICATIONS

Source-backed technical data.

These fields are projected from the product master record. Conflicting, missing and internal-only values do not enter this table.

Scale Pitch
20 µm
Standard Resolution Options
5 / 10 / 20 / 50 / 100 nm
Readhead Dimensions
21 × 10 × 5 mm
Installation Gap
0.6 ±0.1 mm
Output Signals
A+/A- / B+/B- / Z+/Z-
Supply Voltage
5 V ±5%
Protection Rating
IP40
Scale Materials
glass / stainless steel option stated

Source records: SRC-HOPO-MP2-DAT-001 · SRC-HOPO-MP2-DWG-001 · SRC-HOPO-MP2-CAD-001 · SRC-HOPO-CAT-2025-001

SUITABLE APPLICATIONS

Evaluate fit in context.

Compact stages
Microscope platforms
Laboratory automation
OEM motion modules

TECHNICAL EVALUATION

Confirm the configuration against your machine or process.

Send the motion profile, installation envelope, environment or lithography process target. We will turn it into a structured selection review.

Discuss your application