High-speed architecture
The larger scale pitch supports configurations optimized for higher motion speed.
HIGH-SPEED INCREMENTAL LINEAR FEEDBACK
SMG26 High-Speed Incremental Optical Linear Encoder
A 256 µm pitch optical linear encoder family with configurations developed for high-speed precision motion.
Brand ZEPTOOLSSupplied by SENFU TechnologyManufacturer Dongguan Zeptools Technology Co., Ltd.
SMG26SOURCE-BACKED RECORD
PRODUCT OVERVIEW
Selection starts with the operating requirement.
SMG26 is suited to OEM motion architectures that need a compact readhead and a broader speed envelope. Final performance depends on the selected resolution, output frequency and integration conditions.
Open technical itemExact vacuum grade and outgassing evidence remain to be confirmed.
ENGINEERING VALUE
What this platform brings to the design.
Resolution options
Published technical data includes resolution choices down to 4 nm.
Documented EMC scope
Available compliance records are associated at model and interface level.
KEY SPECIFICATIONS
Source-backed technical data.
These fields are projected from the product master record. Conflicting, missing and internal-only values do not enter this table.
- Scale Pitch
- 256 µm
- Resolution Options
- 1000 / 400 / 200 / 100 / 40 / 20 / 10 / 4 nm
- Readhead Dimensions
- 4.3 × 11 × 16.8 mm
- Scale Accuracy
- ±5 µm/m · 20°C
- Output Signals
- A+/A- / B+/B- / Z+/Z-
- Supply Voltage
- 5 V ±10%
- Operating Temperature
- -40 to +100 °C
- Maximum Cable Length
- 10 m
Source records: SRC-ZEP-SMG26-MAN-001 · CERT-ZEP-SMG26-EMC-001
SUITABLE APPLICATIONS
Evaluate fit in context.
↗Linear motors
↗High-speed XY stages
↗Semiconductor tools
↗Scientific motion platforms
ENGINEERING DOCUMENTATION
Start the review with the original source files.
Downloads are linked to this product record. Commercial terms, final configuration and suitability remain subject to technical review.
TECHNICAL EVALUATION
Confirm the configuration against your machine or process.
Send the motion profile, installation envelope, environment or lithography process target. We will turn it into a structured selection review.
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