Partition the pattern
Identify which layers or geometries require EBL and which can use optical direct write.
TECHNOLOGY / HYBRID PROCESS
Hybrid lithography: combining maskless and electron beam lithography.
Assign large microscale patterns to DMD exposure and reserve EBL for critical nanoscale structures.
ENGINEERING CONTEXT
The decision starts with the real constraint.
A hybrid flow can reduce unnecessary electron-beam write area while preserving nanoscale capability. Its value depends on cross-tool alignment, resist compatibility, process sequencing and metrology.
Discuss your requirement ↗CRITICAL REQUIREMENTS
Define these before model selection.
Share alignment
Design marks and overlay budgets that both exposure systems can use.
Validate the process
Record resist, dose, development, metrology and yield for each handoff.
SOLUTION ROUTES
Continue from requirement to system.
EVIDENCE CHECKLIST
Ask for evidence that closes the decision.
- Process flow
- Alignment-mark design
- SEM and profile data
- Overlay and yield results
TECHNICAL REVIEW
Turn the requirement into a selection brief.
Send the application, critical parameters and any drawing or process information available.
Discuss your application ↗