Active autofocus
Laser-based focus control supports more consistent exposure over the working area.
ADVANCED DMD MASKLESS LITHOGRAPHY
Advanced DMD Maskless Lithography Platform
An advanced DMD direct-write platform with active autofocus and finer overlay capability for demanding research fabrication.
Brand ZEPTOOLSSupplied by SENFU Technology
ZML100ASOURCE-BACKED RECORD
PRODUCT OVERVIEW
Selection starts with the operating requirement.
ZML100A fits advanced R&D programs that need more automated focus control, tighter overlay and optional larger-substrate handling.
Open technical itemThroughput claims remain conditional pending exposure-setting documentation.
ENGINEERING VALUE
What this platform brings to the design.
Advanced alignment
Source specifications document a tighter overlay target than the compact platform.
Research flexibility
Pattern formats and objective control support varied process-development workflows.
KEY SPECIFICATIONS
Source-backed technical data.
These fields are projected from the product master record. Conflicting, missing and internal-only values do not enter this table.
- Minimum Feature
- 0.5 µm
- Minimum Equal Line Space
- 1 µm
- Overlay Accuracy
- 0.5 µm · 5 × 5 mm
- Exposure Wavelengths
- 385 / 405 nm
- Autofocus
- laser active autofocus
- Motorized Objective Switching
- true
- Sample Size
- 5 × 5 mm minimum; 4 inch standard; 6 inch optional
- Pattern Formats
- DXF / GDS / BMP
Source record: SRC-ZEP-ZML-BRO-001
SUITABLE APPLICATIONS
Evaluate fit in context.
↗Advanced MEMS
↗Micro-optics
↗2D materials
↗Photonics research
ENGINEERING DOCUMENTATION
Start the review with the original source files.
Downloads are linked to this product record. Commercial terms, final configuration and suitability remain subject to technical review.
TECHNICAL EVALUATION
Confirm the configuration against your machine or process.
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