Optical function
Translate target phase, profile or periodicity into lithography requirements.
APPLICATION / PHOTONICS & MICRO-OPTICS
Lithography workflows for photonics and micro-optics.
Select between grayscale optical patterning and electron-beam writing according to profile and critical dimension.
ENGINEERING CONTEXT
The decision starts with the real constraint.
Photonic structures may combine broad optical features, multilevel topography and critical nanoscale elements. A hybrid process can assign each pattern level to the most suitable exposure technology.
Discuss your requirement ↗CRITICAL REQUIREMENTS
Define these before model selection.
Critical dimension
Separate microscale area patterning from nanoscale critical structures.
Layer strategy
Define overlay, alignment marks, resist stack and metrology between exposures.
SOLUTION ROUTES
Continue from requirement to system.
EVIDENCE CHECKLIST
Ask for evidence that closes the decision.
- Profile measurement
- SEM or optical micrograph
- Resist and development conditions
- Overlay result
TECHNICAL REVIEW
Turn the requirement into a selection brief.
Send the application, critical parameters and any drawing or process information available.
Discuss your application ↗