Larger substrates
The documented sample range extends the DMD platform to 8-inch formats.
8-INCH DMD MASKLESS LITHOGRAPHY
8-Inch DMD Maskless Lithography System
A larger-substrate DMD maskless lithography platform for research and process-development workflows up to 8 inches.
Brand ZEPTOOLSSupplied by SENFU Technology
ZML200ASOURCE-BACKED RECORD
PRODUCT OVERVIEW
Selection starts with the operating requirement.
ZML200A extends the ZML platform to larger substrates while retaining direct-write pattern flexibility and active autofocus.
Open technical itemMaximum lithography rate is not promoted without mapped exposure conditions.
ENGINEERING VALUE
What this platform brings to the design.
Direct-write workflow
Digital patterns reduce photomask dependency during iterative development.
Automated focus
Active autofocus supports process consistency across a larger exposure area.
KEY SPECIFICATIONS
Source-backed technical data.
These fields are projected from the product master record. Conflicting, missing and internal-only values do not enter this table.
- Minimum Feature
- 0.5 µm
- Minimum Equal Line Space
- 1 µm
- Overlay Accuracy
- 0.5 µm · 5 × 5 mm
- Exposure Wavelengths
- 385 / 405 nm
- Autofocus
- laser active autofocus
- Sample Size
- 5 × 5 mm minimum; 8 inch maximum
- Sample Thickness
- 0 to 10 mm
- Pattern Formats
- DXF / GDS / BMP
Source record: SRC-ZEP-ZML-BRO-001
SUITABLE APPLICATIONS
Evaluate fit in context.
↗Large-area R&D
↗MEMS process development
↗Micro-optics
↗Research pilot lines
ENGINEERING DOCUMENTATION
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Downloads are linked to this product record. Commercial terms, final configuration and suitability remain subject to technical review.
TECHNICAL EVALUATION
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