Mask-free iteration
Move from DXF, GDS or BMP pattern files to exposure without a physical photomask.
COMPACT DMD MASKLESS LITHOGRAPHY
Compact R&D DMD Maskless Lithography System
A compact direct-write lithography system for laboratory research, rapid process iteration and small-substrate microfabrication.
Brand ZEPTOOLSSupplied by SENFU Technology
ZML10ASOURCE-BACKED RECORD
PRODUCT OVERVIEW
Selection starts with the operating requirement.
ZML10A is the entry point for laboratories evaluating DMD maskless lithography across MEMS, microfluidics and research prototyping.
Open technical itemThroughput values are withheld until objective, dose and exposure conditions are mapped.
ENGINEERING VALUE
What this platform brings to the design.
Laboratory format
Designed around research-scale samples and iterative process development.
Multi-application platform
Supports workflows spanning MEMS, microfluidics and photonic microstructures.
KEY SPECIFICATIONS
Source-backed technical data.
These fields are projected from the product master record. Conflicting, missing and internal-only values do not enter this table.
- Minimum Feature
- 0.5 µm
- Minimum Equal Line Space
- 1 µm
- Overlay Accuracy
- 1 µm · 5 × 5 mm
- Exposure Wavelengths
- 385 / 405 nm
- Sample Size
- 5 × 5 mm minimum; 4 inch maximum
- Sample Thickness
- 0 to 10 mm
- Pattern Formats
- DXF / GDS / BMP
- Grayscale Lithography
- 2D and 8-bit grayscale stated
Source record: SRC-ZEP-ZML-BRO-001
SUITABLE APPLICATIONS
Evaluate fit in context.
↗MEMS
↗Microfluidics
↗Rapid prototyping
↗Academic cleanrooms
ENGINEERING DOCUMENTATION
Start the review with the original source files.
Downloads are linked to this product record. Commercial terms, final configuration and suitability remain subject to technical review.
TECHNICAL EVALUATION
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